F. Laske

Accurate mask registration on tilted lines for 6F2 DRAM manufacturing

K. D. Roeth, W. Choi, Y. Lee, 2015, SPIE Photomask Technology.

Evaluation of KLA-Tencor LMS IPRO5 beta system for 22nm node registration and overlay applications

F. Laske, M. Ferber, K.-D. Röth, 2011, Photomask Technology.

In-die mask registration for multi-patterning

F. Laske, M. Daneshpanah, M. Ferber, 2013, Photomask Technology.

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

F. Laske, R. Gronheid, N. Gutman, 2020, Advanced Lithography.

Proximity corrected accurate in-die registration metrology

F. Laske, M. Daneshpanah, H. Yamaguchi, 2014, Photomask and Next Generation Lithography Mask Technology.

Mask contribution to intra-field wafer overlay

F. Laske, M. Daneshpanah, M. Ferber, 2014, Advanced Lithography.

Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks

F. Laske, Seurien Chou, J. Whittey, 2009, Photomask Technology.

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

F. Laske, R. Gronheid, H. Stoschus, 2021, Advanced Lithography.

High-precision and cost-effective EUV reticle defect registration with integrated grid matching using KLA LMS IPRO and FlashScan

F. Laske, O. Lohse, H. Steigerwald, 2021, Photomask Technology.