Kyu-Tae Sun

发表

Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Kevin Ryan, Young-Sun Hwang, Youping Zhang, 2015, Advanced Lithography.

Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy

Paul Böcker, Sangjun Han, Elliott McNamara, 2015, SPIE Photomask Technology.

Understanding of stochastic noise

Chang-Moon Lim, Chang-Nam Ahn, Anita Fumar-Pici, 2015, Advanced Lithography.

Mixed-mode, high-order multi-patterning control strategy with small-spot, optical CD metrology on device structures

Taeddy Kim, Rui Zhang, Yi Song, 2016, SPIE Advanced Lithography.

OPC optimization techniques for enabling the reduction of mismatch between overlay metrology and the device pattern cell

Jaehee Hwang, Youping Zhang, Shinyoung Kim, 2016, SPIE Advanced Lithography.

Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

Paul Böcker, Kevin Ryan, Gwang-Gon Kim, 2016, Advanced Lithography.

Applications of MoSi-based binary intensity mask for sub-40nm DRAM

Sunyoung Koo, Jun-Taek Park, Sung-Ki Park, 2010, Advanced Lithography.

Improvement of the process overlay control for sub-40-nm DRAM

Sungki Park, Hye-Jin Shin, Seung-Hyun Hwang, 2010, Advanced Lithography.

CD uniformity optimization at volume ramp up stage for new product introduction

Won-Kwang Ma, Greet Storms, Jin-Soo Kim, 2014, Advanced Lithography.

Spacer multi-patterning control strategy with optical CD metrology on device structures

Sangjun Han, Wei Guo, Young-Sik Kim, 2016, SPIE Advanced Lithography.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Kevin Ryan, Sung-Ki Park, Michael Kubis, 2015, Advanced Lithography.