Hugo Augustinus Joseph Cramer

High speed optical metrology solution for after etch process monitoring and control

Shaunee Cheng, Baukje Wisse, Henk Niesing, 2014, Advanced Lithography.

YieldStar: a new metrology platform for advanced lithography control

Kaustuve Bhattacharyya, Michael Kubis, Martin Ebert, 2011, European Mask and Lithography Conference.

Combined overlay, focus and CD metrology for leading edge lithography

Michael Kubis, Martin Ebert, Henry Megens, 2011, Advanced Lithography.

Total test repeatability: a new figure of merit for CD metrology tools

Peter Vanoppen, Mircea Dusa, Jeroen Meessen, 2004, SPIE Advanced Lithography.

Application of optical CD for characterization of 70nm dense lines

Mircea Dusa, Hugo Augustinus Joseph Cramer, Ton Kiers, 2005, SPIE Advanced Lithography.

Lithographic scanner stability improvements through advanced metrology and control

Peter Vanoppen, Timon Fliervoet, Martin Ebert, 2010, Advanced Lithography.

Spacer multi-patterning control strategy with optical CD metrology on device structures

Sangjun Han, Wei Guo, Young-Sik Kim, 2016, SPIE Advanced Lithography.