Shuji Fujiwara

A Unified Query Processing Technique with Metadata in Sensor Network

Yuki Ueda, Yusuke Yokota, Eiji Okubo, 2009 .

Exposure and resist-process condition dependence of replicated-pattern accuracy in SR lithography

Takeo Watanabe, S. Suzuki, Shuji Fujiwara, 1993, Advanced Lithography.

Source engineering for ESD robust NLDMOS

Tetsuro Hirano, Yuichi Watanabe, Toshihiro Okuda, 2011, EOS/ESD Symposium Proceedings.

ESD Robustness Enhancement Study of Ultra-High-Voltage JFET With Ballast Structure

Shuji Fujiwara, 2017, IEEE Transactions on Device and Materials Reliability.

Fabrication of x-ray masks with 0.15-um level two-dimensional patterns by using highly accurate FIB lithography

Takeo Watanabe, S. Suzuki, Shuji Fujiwara, 1993, Advanced Lithography.

10 Nm Fabrication By Focused Ion Beam

Masanori Komuro, Nobufumi Atoda, Shuji Fujiwara, 1987, Advanced Lithography.

ESD robust 800V SCR-JFET with p+ ballast structure

Richard Burton, Shuji Fujiwara, 2016, 2016 38th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD).