Kazuhisa Hasumi

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi, K. Hasumi, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Contact inspection of Si nanowire with SEM voltage contrast

Naoto Horiguchi, Takeyoshi Ohashi, Atsuko Yamaguchi, 2018, Advanced Lithography.

Variability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element

Takeyoshi Ohashi, Atsuko Yamaguchi, Osamu Inoue, 2017, Advanced Lithography.

SEM-based overlay measurement between via patterns and buried M1 patterns using high-voltage SEM

Sandip Halder, Gian F. Lorusso, Christiane Jehoul, 2017, Advanced Lithography.

Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast

Naoto Horiguchi, Takeyoshi Ohashi, Masami Ikota, 2019 .

Enabling CD SEM metrology for 5nm technology node and beyond

Gian Francesco Lorusso, Naoto Horiguchi, Christopher J. Wilson, 2017, Advanced Lithography.

SEM based overlay measurement between resist and buried patterns

Gian F. Lorusso, Philippe Leray, Osamu Inoue, 2016, SPIE Advanced Lithography.

EB metrology of Ge channel gate-all-around FET: buckling evaluation and EB damage assessment

Naoto Horiguchi, Takeyoshi Ohashi, Liesbeth Witters, 2020, Advanced Lithography.

Precise measurement of thin-film thickness in 3D-NAND device with CD-SEM

Takeyoshi Ohashi, Atsuko Yamaguchi, Masami Ikota, 2018, Journal of Micro/Nanolithography, MEMS, and MOEMS.