Katsura Otaki

发表

Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations

Iwao Nishiyama, Masaaki Ito, Christof G. Krautschik, 2001, SPIE Advanced Lithography.

Comparisons between EUV at-wavelength metrological methods

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2005, SPIE Optics + Photonics.

Aspherical mirror measurement using a point diffraction interferometer

Kazuya Ota, Iwao Nishiyama, Shinji Okazaki, 2002, SPIE Advanced Lithography.

Grating-assisted superresolution for scanning optical systems

Katsura Otaki, Hiroshi Ooki, Jun Saito, 1999, Optical Data Storage.

Method for designing phase-calculation algorithms for two-dimensional grating phase-shifting interferometry.

Ayako Sugaya, Kiyoshi Uchikawa, Katsumi Sugisaki, 2011, Applied optics.

Wide field snapshot imaging polarimeter using modified Savart plates

Naooki Saito, Kazuhiko Oka, Katsura Otaki, 2013, Optics & Photonics - Optical Engineering + Applications.

Absolute measurement of a spherical surface using a point diffraction interferometer

Yutaka Ichihara, Florian Bonneau, Katsura Otaki, 1999, Other Conferences.

Polarization effect on signal from optical ROM using SIL

Katsura Otaki, Hiroshi Ooki, Hisao Osawa, 1999, Optical Data Storage.

EUV wavefront measurement of six-mirror optics using EWMS

Masanobu Hasegawa, Hideo Yokota, Takayuki Hasegawa, 2008, SPIE Advanced Lithography.

Advanced point diffraction interferometer for EUV aspherical mirrors

Kazuya Ota, Iwao Nishiyama, Shinji Okazaki, 2001, SPIE Advanced Lithography.

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2004, SPIE Optics + Photonics.

Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL

Katsuhiko Murakami, Shigeru Nakayama, Mikihiko Ishii, 2004, SPIE Optics + Photonics.

Experimental comparison of absolute PDI and lateral shearing interferometer

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2005, SPIE Advanced Lithography.

Simulation of readout signals with near-field SIL

Takeshi Irita, Katsura Otaki, Hiroshi Ooki, 1998, Other Conferences.

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

Masanobu Hasegawa, Akiyoshi Suzuki, Masahito Niibe, 2007, Applied optics.

Simulation of Multilayer Defects in Extreme Ultraviolet Masks

Tsuneo Terasawa, Iwao Nishiyama, Masaaki Ito, 2001 .

Asymmetric Properties of the Aerial Image in Extreme Ultraviolet Lithography

Katsura Otaki, K. Otaki, 2000 .

Ultra High-Precision Wavefront Metrology Using EUV Low Brightness Source

Masanobu Hasegawa, Mitsuo Takeda, Katsuhiko Murakami, 2014 .

EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2006 .

Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror

Kazuya Ota, Iwao Nishiyama, Shinji Okazaki, 2002 .

Angular spectrum calculations for arbitrary focal length with a scaled convolution.

Ayako Sugaya, Kiyoshi Uchikawa, Katsumi Sugisaki, 2011, Optics express.

Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation

Kazuya Ota, Iwao Nishiyama, Shinji Okazaki, 2002 .

Polarization Effect on Signal from Optical ROM Using Solid Immersion Lens

Katsura Otaki, Hiroshi Ooki, J. Saito, 2000 .

Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2004 .