Noh-Jung Kwak

Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy

Paul Böcker, Sangjun Han, Elliott McNamara, 2015, SPIE Photomask Technology.

Highly Scalable Saddle-Fin (S-Fin) Transistor for Sub-50nm DRAM Technology

Kwang-Ok Kim, Seung-Chan Moon, Jin-Soo Kim, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Improvement of the process overlay control for sub-40-nm DRAM

Sungki Park, Hye-Jin Shin, Seung-Hyun Hwang, 2010, Advanced Lithography.

Spacer multi-patterning control strategy with optical CD metrology on device structures

Sangjun Han, Wei Guo, Young-Sik Kim, 2016, SPIE Advanced Lithography.

Challenges in high-aspect ratio contact (HARC) etching for DRAM capacitor formation

Sungki Park, Yongjin Kim, Noh-Jung Kwak, 2015, Advanced Lithography.

Development of New TiN/ZrO2/Al2O3/ZrO2/TiN Capacitors Extendable to 45nm Generation DRAMs Replacing HfO2 Based Dielectrics

Noh-Jung Kwak, Han-Sang Song, Ki-Seon Park, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Effects of phase of underlying W film on chemical vapor deposited-W film growth and applications to contact-plug and bit line processes for memory devices

Tae-Sik Yoon, Noh-Jung Kwak, Hyunchul Sohn, 2007 .