Lars Barzen

Inverse H/D isotope effects in benzene activation by cationic and anionic cobalt clusters.

G. Niedner‐Schatteburg, M. Tombers, Lars Barzen, 2013, The journal of physical chemistry. A.

Precise in situ etch depth control of multilayered III−V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

H. Fouckhardt, J. Strassner, Christoph Doering, 2016, Beilstein journal of nanotechnology.

Atomic layer sensitive in-situ plasma etch depth control with reflectance anisotropy spectroscopy (RAS)

Henning Fouckhardt, Christoph Doering, Ann-Kathrin Kleinschmidt, 2017, Optical Metrology.

Influence of plasma composition on reflectance anisotropy spectra for in situ III–V semiconductor dry-etch monitoring

H. Fouckhardt, J. Strassner, Christoph Doering, 2015 .

Monitoring of (reactive) ion etching (RIE) with reflectance anisotropy spectroscopy (RAS) equipment

Johannes M. Richter, H. Fouckhardt, M. Kopnarski, 2015 .