G. Mazaleyrat

Multiscale Modeling of the Atomic Layer Deposition of HfO2 Thin Film Grown on Silicon: How to Deal with a Kinetic Monte Carlo Procedure.

A. Dkhissi, A. Estève, M. Rouhani, 2008, Journal of chemical theory and computation.

Nucleation and growth of atomic layer deposition of HfO2 gate dielectric layers on silicon oxide: a multiscale modelling investigation.

A. Dkhissi, A. Estève, A Dkhissi, 2009, Physical chemistry chemical physics : PCCP.

A methodology for the kinetic Monte Carlo simulation of alumina atomic layer deposition onto silicon

Alain Estève, L. Jeloaica, A. Estève, 2005 .

Atomic Scale Modeling of ZrO 2 and HfO 2 Atomic Layer Deposition on Silicon: Linking Density Functional Theory and Kinetic Monte Carlo

A. Dkhissi, A. Estève, M. Rouhani, 2003 .