J. Nakos

Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/

James S. Nakos, P. Geiss, J. Lasky, 1991 .

Low temperature formation of C54–TiSi2 using titanium alloys

F. d'Heurle, C. Cabral, C. Lavoie, 1997 .

Dopant segregation during vertical Bridgman-Stockbarger growth with melt stabilization by strong axial magnetic fields

Shahryar Motakef, D. H. Matthiesen, August F. Witt, 1987 .

The evolution of IBM CMOS DRAM technology

John K. DeBrosse, Steven H. Voldman, James S. Nakos, 1995, IBM J. Res. Dev..

Semiconductor process and structural optimization of shallow trench isolation-defined and polysilicon-bound source/drain diodes for ESD networks

R. Gauthier, J. Pekarik, J. Pekarik, 1998, Electrical Overstress/ Electrostatic Discharge Symposium Proceedings. 1998 (Cat. No.98TH8347).