Y. Hwang

Ti-silicide with improved thermal stability using silicidation through oxide on amorphous silicon substrates

J. Choi, Sung-Goon Kang, J. Lee, 1993 .

The morphological degradation mechanism of the TiSi2/Si structure

H. S. Kim, J. Choi, S. I. Lee, 1993 .

Characteristics of TiSi2 contact to BF2-doped single-silicon

J. Chung, J. Lee, S. Paek, 1993, Journal of Materials Science.

Electrical characteristics of TaSi2p+Si and TiSi2p+Si contacts formed by rapid thermal annealing

Hyun-Choon Cho, S. Paek, Y. Hwang, 1992 .