Susumu Naito

发表

Spatial Distribution of SiH3 Radicals in RF Silane Plasma

A. Matsuda, T. Goto, E. Hirota, 1990 .

Correlation between CH3 Radical Density and Carbon Thin-Film Formation in RF Discharge CH4 Plasma

T. Hattori, N. Ito, T. Goto, 1994 .

Effect of Rare Gas Dilution on CH3 Radical Density in RF-Discharge CH4 Plasma

T. Hattori, N. Ito, T. Goto, 1993 .

Calculated three dimensional spatial distribution of CH3 radical density in the RF discharge CH4 plasma with parallel-plate electrodes

T. Hattori, N. Ito, T. Goto, 1994 .

H 2 Partial Pressure Dependences of CH 3 Radical Density and Effects of H 2 Dilution on Carbon Thin-Film Formation in RF Discharge CH 4 Plasma

T. Hattori, N. Ito, T. Goto, 1995 .

Measurement of CH3 Radical in RF Methane/Rare Gas Plasma Using Infrared Diode Laser Absorption Spectroscopy

T. Goto, H. Nomura, Susumu Naito, 1992 .

Development of Planar Oxygen Sensor

Susumu Naito, Tomio Sugiyama, Yasuki Nakamura, 2001 .