G. Parris

Catalytic cracking of organic amides: II. Use of substituted amides, mechanism, and a predictive index for reactivity

J. Armor, G. Parris, 1991 .

Formulated surface conditioners in 50 nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Minoru Sugiyama, Patrick Wong, Masakazu Sanada, 2007, SPIE Advanced Lithography.