F. C. Dassapa

Silicide formation in metal/Si structures and diffusion barrier properties of CVD tungsten films

Y. Pauleau, F. Romagna, J. Oberlin, 1989 .

SIMS depth profiles study of WSi structures produced via the silicon reduction of tungsten hexafluoride

C. Dubois, Y. Pauleau, A. Sibai, 1993 .

Sensitive End-Point Detection for Dielectric Etch

E. Hudson, F. C. Dassapa, 2001 .