Shiniti Yoshida

An Application of the Microstructure-Bifurcation Theory to the γ′-particle Coarsening of Ni-Cu-Si Alloys

T. Miyazaki, M. Fukaya, Shiniti Yoshida, 1987 .

Role of Nitrogen Incorporation into Hf-Based High-k Gate Dielectrics for Termination of Local Current Leakage Paths

T. Chikyow, N. Umezawa, S. Kamiyama, 2005 .

Thermal Degradation of HfSiON Dielectrics Caused by TiN Gate Electrodes and Its Impact on Electrical Properties

Y. Nara, Heiji Watanabe, K. Yasutake, 2005 .