C. Demeurisse

CoSi 2 formation from Co x Ni 1-x /Ti system

A. Lauwers, K. Maex, A. Vantomme, 2002 .

Silicides for the 100-nm node and beyond: Co-silicide, Co(Ni)-silicide and Ni-silicide

Karen Maex, Christa Vrancken, Annick Lauwers, 2002 .

Silicides and germanides for nano-CMOS applications

K. Opsomer, J. Kittl, A. Lauwers, 2008 .

Ni fully silicided gates for 45nm CMOS applications

T. Schram, A. Veloso, G. Pourtois, 2005 .

Low temperature spike anneal for Ni-silicide formation

J. Kittl, A. Lauwers, M. Potter, 2004 .

Modulation of the effective work function of fully-silicided (FUSI) gate stacks

A. Veloso, G. Pourtois, J. Kittl, 2007 .