Jennifer Church

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Joe Lee, Akiteru Ko, Cody Murray, 2020, Advanced Lithography.

Study of resist hardmask interaction through surface activation layers

Jing Guo, Luciana Meli, Anuja De Silva, 2018, Photomask Technology.

Does explicitness help

Jennifer Church, 1999 .

Investigation of mask absorber induced image shift in EUV lithography

Nelson Felix, Martin Burkhardt, Luciana Meli, 2019, Advanced Lithography.

Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch

Nelson Felix, Ravi Bonam, Mary Breton, 2020, Advanced Lithography.

The Information Commons at Lied Library

Jason Vaughan, Katherine Rankin, Jennifer Church, 2002 .

Department of Defense’s Use of Contractors to Support Military Operations: Background, Analysis, and Issues for Congress

Jennifer Church, Moshe Schwartz, Jennifer Church, 2013 .