Katie Lutker-Lee

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Joe Lee, Akiteru Ko, Cody Murray, 2020, Advanced Lithography.

Novel bottom-up organic mandrel growth to enable organic mandrel EUV SADP for sub-5nm node technologies

Angélique Raley, David O'Meara, Katie Lutker-Lee, 2021, Advanced Lithography.

Line edge roughness reduction for EUV self-aligned double patterning by surface modification on spin-on-carbon and tone inversion technique

Peter Biolsi, Angélique Raley, Gregory Denbeaux, 2021 .