T. Enomoto

Correlation between the pressure-induced changes in the Hall coefficient and Tc in superconducting cuprates

Y. Iye, N. Mōri, Y. Kubo, 1991 .

Is pressure dependence of Tc through change in carrier density

Y. Iye, A. Fukushima, Takehiko Matsumoto, 1991 .

Thermal Oxidation Rate of a Si3N4Film and Its Masking Effect against Oxidation of Silicon

Hiroshi Morita, Tatsuya Enomoto, Ryo Ando, 1978 .

Etching Characteristics of Silicon and its Compounds by Gas Plasma

Haruhiko Abe, Tatsuya Enomoto, Yukio Sonobe, 1973 .

Loading Effect and Temperature Dependence of Etch Rate in CF4 Plasma

A. Yasuoka, H. Nakata, M. Denda, 1979 .

The applications of the high-pressure oxidation process to the fabrication of MOS LSI

T. Enomoto, N. Tsubouchi, H. Miyoshi, 1979, IEEE Transactions on Electron Devices.

Effects of Nitride Deposition Conditions on Characteristics of an MNOS Nonvolatile Memory Transistor

H. Nakayama, T. Enomoto, 1979 .