Ulrich Gottlieb

Thermal annealing of amorphous Ti–Si–O thin films

M. Audier, J. Deschanvres, O. Chaix-Pluchery, 2008 .

Growth of Amorphous Ti – Si – O Thin Films by Aerosol CVD Process at Atmospheric Pressure

J. Deschanvres, A. Hodroj, Ulrich Gottlieb, 2008 .

Electron tunneling through grain boundaries in transparent conductive oxides and implications for electrical conductivity: the case of ZnO:Al thin films

D. Bellet, D. Muñoz, V. Nguyen, 2018 .