Junichi Kai

Deflection error due to charge-up effect of reticle substrate

Junji Hirumi, Eiichi Hoshino, Kouji Hosono, 1998, Photomask and Next Generation Lithography Mask Technology.

Multielectron beam blanking aperture array system SYNAPSE‐2000

Junichi Kai, Hiroshi Yasuda, Soichiro Arai, 1996 .

Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

Yasushi Takahashi, Keiichi Betsui, Junichi Kai, 1993 .