Shuichi Tamamushi

Performance improvement in electron-beam reticle writing system

Ryoichi Hirano, Hirohito Anze, Yoji Ogawa, 1995, Photomask and Next Generation Lithography Mask Technology.

Reticle flexure influence on pattern positioning accuracy for reticle writing

Ryoichi Hirano, Yoshihiko Takahashi, Toru Tojo, 1995, Photomask and Next Generation Lithography Mask Technology.

Analysis of pattern shift error for mask clamping measured by Nikon XY-31

Ryoichi Hirano, Toru Tojo, Yoji Ogawa, 1995, Photomask and Next Generation Lithography Mask Technology.