J. Lingnau

Negative-tone high-resolution photocatalytic resist for x-ray lithography

H. Oertel, H. Huber, J. Trube, 1989 .

Computer-aided resist modelling with extended XMAS in x-ray lithography

J. Lingnau, J. Theis, H.-L. Huber, 1989 .

Laser plasma as X-ray source for lithographic imaging of submicron structures onto experimental X-ray resist

F. Bijkerk, G. Dorssen, R. Dammel, 1989 .

Photocatalytic Novolak-based positive resist for X-ray lithography—kinetics and simulation

J. Lingnau, J. Theis, H.-L. Huber, 1987 .