Jen-Chieh Shih

Preparation and characterization of copolymers containing (+)‐bornyl methacrylate and their racemate for positive‐tone photoresist

Jui‐Hsiang Liu, Wei Ting Chen, Jen-Chieh Shih, 2001 .

Novel Crosslinking Method for Negative Tone Photoresist having Pendant Carboxyl Moieties

Jui‐Hsiang Liu, Jen-Chieh Shih, 2001 .

Preparation and characterization of photoreactive copolymers containing curable pendants for positive photoresist

Jui‐Hsiang Liu, Seng-Hei Lin, Jen-Chieh Shih, 2001 .

Reflow Process for Contact Hole ArF Lithography

Shang-Ho Lin, J. H. Chen, D. C. Owe-Yang, 2004 .