Kazuhiko Mishima

Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Mitsuru Hiura, Yukio Takabayashi, Jin Choi, 2017, Advanced Lithography.

New projection optics and aberration control system for the 45-nm node

Seiya Miura, Kazuhiko Mishima, Yasuo Hasegawa, 2007, SPIE Advanced Lithography.

Alignment sensor corrections for tool-induced shift (TIS)

Tsuneo Kanda, Hideki Ina, Eiichi Murakami, 1997, Advanced Lithography.

The solutions for 3D-NAND processes with Canon's latest KrF scanner

Kazuhiro Takahashi, Kazuhiko Mishima, Masanori Yamada, 2017, 2017 China Semiconductor Technology International Conference (CSTIC).

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takamitsu Komaki, Kazuhiko Mishima, Kazuhiro Takahashi, 2020 .

A study of overlay mark robustness and enhanced alignment techniques for alignment improvement on metal layers of sub-100nm technology

Hiroshi Tanaka, Toru Nakamura, Akihiko Honda, 2007, SPIE Advanced Lithography.