Yoshio Suzaki

Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Mitsuru Hiura, Yukio Takabayashi, Jin Choi, 2017, Advanced Lithography.

Overlay improvements using a novel high-order distortion correction system for NIL high-volume manufacturing

Mitsuru Hiura, Tatsuya Hayashi, Atsushi Kimura, 2018, Advanced Lithography.

Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing

Mitsuru Hiura, Jin Choi, Tatsuya Hayashi, 2017, Photomask Technology.

Nanoimprint performance improvements for high volume semiconductor device manufacturing

Mitsuru Hiura, Yukio Takabayashi, Anshuman Cherala, 2021, Advanced Lithography.

Nanoimprint lithography methods for achieving sub-3nm overlay

Mitsuru Hiura, Osamu Morimoto, Kenji Yamamoto, 2021, Photomask Technology.

Nanoimprint performance improvements for high volume semiconductor device manufacturing

Mitsuru Hiura, Anshuman Cherala, Hiroshi Morohoshi, 2021, Photomask Japan.