Robert D. Allen

发表

Evolution of a 193-nm bilayer resist for manufacturing

William R. Brunsvold, Phillip J. Brock, David R. Medeiros, 2002, SPIE Advanced Lithography.

FIRE PROTECTION RESEARCH PROGRAM FOR SUPERSONIC TRANSPORT

Melvin Gerstein, Robert D. Allen, 1964 .

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

William R. Brunsvold, Hiroshi Ito, Thomas I. Wallow, 2000, Advanced Lithography.

Acid-catalyzed single-layer resists for ArF lithography

Roderick R. Kunz, Gregory M. Wallraff, William D. Hinsberg, 1993, Advanced Lithography.

Characterization of new aromatic polymers for 157-nm photoresist applications

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

Restoration of Full Power Capability on International Space Station Following Leak in the Radiator

Robert D. Allen, Gyan Hajela, Eileen Mouradian, 1999 .

Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Donald C. Hofer, Gregory M. Wallraff, Thomas I. Wallow, 1998, Advanced Lithography.

Evaluation of InGaAs camera for scientific near infrared imaging applications

Robert D. Allen, Ravi K. Guntupalli, 2006, SPIE Optics + Photonics.

Supercritical fluid processing: opportunities for new resist materials and processes

Christopher K. Ober, Allen H. Gabor, Paula M. Gallagher-Wetmore, 1996, Advanced Lithography.

Effect of molecular weight distribution on the dissolution properties of novolac blends

C. Grant Willson, Anwei Qin, Pavlos C. Tsiartas, 1995, Advanced Lithography.

Materials evaluation of antireflective coatings for single-layer 193-nm lithography

Roderick R. Kunz, Robert D. Allen, 1994, Advanced Lithography.

IBM 193-nm bilayer resist: materials, lithographic performance, and optimization

George M. Jordhamo, Phillip J. Brock, Arpan P. Mahorowala, 2001, SPIE Advanced Lithography.

Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2011, Advanced Lithography.

Progress in 193nm Resists

Hiroshi Ito, Hoa D. Truong, Carl E. Larson, 2000 .

A NEW METHOD OF POLARIZATION MICROSCOPIC ANALYSIS

Robert D. Allen, Robert D. Moore, James Brault, 1963, The Journal of cell biology.

Imaging polymers with supercritical carbon dioxide

Allen H. Gabor, Paula M. Gallagher-Wetmore, Robert D. Allen, 1997 .

Shuttle-Streaming: Synchronization with Heat Production in Slime Mold

Robert D. Allen, R. D. Allen, J. Brault, 1963, Science.

Single-layer chemically amplified photoresists for 193-nm lithography

Gregory Breyta, Roderick R. Kunz, Gregory M. Wallraff, 1993 .

Deep-UV Resist Technology: The Evolution of Materials and Processes for 250-nm Lithography and Beyond

Roderick R. Kunz, Robert D. Allen, Willard Earl Conley, 1997 .

Design Considerations for 193-nm Positive Resists

Donald C. Hofer, Roderick R. Kunz, Gregory M. Wallraff, 1995 .

Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists

Roderick R. Kunz, Gregory M. Wallraff, William D. Hinsberg, 1993 .

The Influence of Photoacid Structure on the Design and Performance of 193-nm Resists

Gregory Breyta, Donald C. Hofer, Thomas I. Wallow, 1997 .

A NEW METHOD OF POLARIZATION MICROSCOPIC ANALYSIS. I. SCANNING WITH A BIREFRINGENCE DETECTION SYSTEM.

Robert D. Allen, Robert D. Moore, J. Brault, 1963 .

Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers

Suresh Valiyaveettil, Robert D. Allen, Kenji Ogino, 2000 .

Advanced Materials for Electronic Applications by Polymerization of Cyclic Olefins Using Late Transition Metal Catalysts

Donald C. Hofer, Thomas I. Wallow, Juliann Opitz, 1998 .

Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists

Gregory M. Wallraff, Phillip J. Brock, Hoa D. Truong, 2009 .

Restoring image quality in the polarizing microscope: analysis of the Allen video-enhanced contrast method

Eric W. Hansen, Robert D. Allen, J. Conchello, 1988 .

Fundamental investigations of the free radical copolymerization and terpolymerization of maleic anhydride, norbornene, and norbornene tert-butyl ester: In-situ mid-infrared spectroscopic analysis

Timothy E. Long, Robert D. Allen, T. Long, 2001 .

Design of Protective Topcoats for Immersion Lithography

Gregory M. Wallraff, William D. Hinsberg, Phillip J. Brock, 2005 .

A Test for Correlation between Residual Solvent and Rates ofN-Methylpyrrolidone Absorption by Polymer Films

Hiroshi Ito, William D. Hinsberg, Scott A. MacDonald, 1993 .