Hoa D. Truong

Evolution of a 193-nm bilayer resist for manufacturing

William R. Brunsvold, Phillip J. Brock, David R. Medeiros, 2002, SPIE Advanced Lithography.

Evaluation of functional properties of imaging materials for water immersion lithography

Gregory M. Wallraff, William D. Hinsberg, Frances A. Houle, 2005, SPIE Advanced Lithography.

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

William R. Brunsvold, Hiroshi Ito, Thomas I. Wallow, 2000, Advanced Lithography.

Characterization of new aromatic polymers for 157-nm photoresist applications

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries

William R. Brunsvold, Hiroshi Ito, Hiroyuki Ishii, 2001, SPIE Advanced Lithography.

IBM 193-nm bilayer resist: materials, lithographic performance, and optimization

George M. Jordhamo, Phillip J. Brock, Arpan P. Mahorowala, 2001, SPIE Advanced Lithography.