S. Döring

Novel CMOS-integrated 512x320 tip-tilt micro mirror array and related technology platform

A. Gehner, S. Döring, D. Rudloff, 2020, OPTO.

Damage testing of EUV optics using focused radiation from a table-top LPP source

S. Döring, K. Mann, F. Barkusky, 2011, Advanced Lithography.

Material analysis with EUV/XUV radiation using a broadband laser plasma source and optics system

S. Döring, K. Mann, F. Barkusky, 2009, Optics + Optoelectronics.

XUV metrology: surface analysis with extreme ultraviolet radiation

P. Loosen, S. Döring, F. Barkusky, 2009, Optics + Optoelectronics.

EUV reflectometry for thickness and density determination of thin film coatings

S. Döring, A. Bayer, K. Mann, 2012 .