T. Lee

Investigating the Wafer Temperature in an Atmospheric-Pressure Plasma Process

G. Kwon, H. Lee, Woo-Jae Kim, 2020, Journal of the Korean Physical Society.

Plasma Etching of Silicon at a High Flow and a High Pressure of NF3 in Reactive Ion Etching

Min-Ho Kang, G. Kwon, H. Lee, 2019, Journal of the Korean Physical Society.