Karen Dabertrand

Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning

Stephanie Kremer, Marco Polli, Mathieu Touchet, 2008, SPIE Advanced Lithography.

Effective work function engineering by sacrificial lanthanum diffusion on HfON-based 14 nm NFET devices

Pierre Caubet, Michel Haond, Gilles Reimbold, 2015, 2015 45th European Solid State Device Research Conference (ESSDERC).

Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques

X. Garros, Laurent Vandroux, Pascal Besson, 2007 .