Jean-Claude Royer

Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning

Stephanie Kremer, Marco Polli, Mathieu Touchet, 2008, SPIE Advanced Lithography.

Lid for road system device and corresponding device road infrastructure

Jean-Claude Royer, Vincent Rotharmel, 2010 .

A propos des concepts de CLOS

Jean-Claude Royer, 1991 .

In-line AFM characterization of STI profile at the 65 nm node with advanced carbon probes

Jean-Claude Royer, Massimo D. Sardo, Audrey Berthoud, 2007, SPIE Advanced Lithography.

The ESRF: A Synchrotron In Europe's Silicon Valley

Jean-Claude Royer, Edward P. Mitchell, Jerome Beaucour, 2014 .

Reducing NOx from existing cement kiln lines

Jean-Claude Royer, Louis Ricci, Jeffrey D. Hook, 2016, 2016 IEEE-IAS/PCA Cement Industry Technical Conference.

A frame for bounding a recess and related assemblies

Jean-Claude Royer, John Neil Pickavance, Alan Jack Pendleton, 2002 .