Youn-Hye Kim

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru‐Interconnects

Soo‐Hyun Kim, J. Bae, D. Mohapatra, 2022, Advanced Functional Materials.

Process Controlled Ruthenium on 2D Engineered V‐MXene via Atomic Layer Deposition for Human Healthcare Monitoring

Soo‐Hyun Kim, M. Z. Ansari, D. Mohapatra, 2023, Advanced science.

Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen

Soo‐Hyun Kim, K. An, Ryosuke Harada, 2022, Chemistry of Materials.

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

Soo‐Hyun Kim, Kirak Son, Young-Bae Park, 2021, Chemistry of Materials.

Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition.

Soo‐Hyun Kim, J. Bae, M. Z. Ansari, 2023, Small.

Atomically dispersed iridium catalysts on silicon photoanode for efficient photoelectrochemical water splitting

Ho Won Jang, Jooho Moon, Hoonkee Park, 2023, Nature Communications.

Interfacial adhesion energies of Ru–Mn direct plateable diffusion barriers prepared by atomic layer deposition for advanced Cu interconnects

Soo‐Hyun Kim, Kirak Son, Young-Bae Park, 2021, Journal of Materials Science: Materials in Electronics.