Tsuneo Kanda

New lens barrel structure utilized on the FPA-6000AS4 and its contribution to the lens performance

Yuji Sudoh, Tsuneo Kanda, 2003, SPIE Advanced Lithography.

0.85-NA ArF exposure system and performances

Tsuneo Kanda, Yoshihiro Shiode, Ken-ichiro Shinoda, 2003, SPIE Advanced Lithography.

New-generation projection optics for microlithography

Takashi Kato, Tsuneo Kanda, 2001, SPIE Advanced Lithography.

Alignment sensor corrections for tool-induced shift (TIS)

Tsuneo Kanda, Hideki Ina, Eiichi Murakami, 1997, Advanced Lithography.

Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

Tsuneo Kanda, Keiji Yoshimura, Hideo Hata, 2008, SPIE Advanced Lithography.