W. Jeong

发表

Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

Youngseok Lee, C. Cho, I. Seong, 2022, Nanomaterials.

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

S. Kim, Youngseok Lee, C. Cho, 2022, Nanomaterials.

Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath

S. Kim, Jangjae Lee, Youngseok Lee, 2022, Sensors.

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled

S. Kim, Jangjae Lee, Youngseok Lee, 2023, Materials.

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma

Jinho Lee, Jangjae Lee, Youngseok Lee, 2022, Nanomaterials.

Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma

S. Kim, Jangjae Lee, Youngseok Lee, 2022, Italian National Conference on Sensors.

Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation

S. Kim, Jangjae Lee, Youngseok Lee, 2022, Italian National Conference on Sensors.

Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe

S. Kim, Jangjae Lee, Youngseok Lee, 2023, Physics of Plasmas.

On the Quenching of Electron Temperature in Inductively Coupled Plasma

S. Kim, Youngseok Lee, C. Cho, 2023, Materials.

Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method

Youngseok Lee, C. Cho, I. Seong, 2023, Materials.

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process

S. Kim, Youngseok Lee, C. Cho, 2023, Sensors.

Experimental Study of Argon and Helium Dielectric Barrier Discharge with Coplanar Electrodes at Intermediate Pressure for Reducing Radar Cross Section

S. Kim, Jangjae Lee, W. Jeong, 2020 .

Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction

Youngseok Lee, C. Cho, Youbin Seol, 2023, Materials.

Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma

Youngseok Lee, C. Cho, Youbin Seol, 2023, Materials.