Yashdeep Khopkar

Dependence of contamination rates on key parameters in EUV optics

Eric M. Gullikson, Vibhu Jindal, Yu-Jen Fan, 2011, Advanced Lithography.

Developing particle detection test bench for vacuum components

Vibhu Jindal, Henry Herbol, Gregory Denbeaux, 2012, Advanced Lithography.

Wavelength dependence of carbon contamination on mirrors with different capping layers

Vibhu Jindal, Yu-Jen Fan, Leonid Yankulin, 2010, Advanced Lithography.

Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation

Brian Cardineau, Seth Kruger, Craig Higgins, 2011, Advanced Lithography.

Evaluating vacuum components for particle performance for EUV lithography

Vibhu Jindal, Gregory Denbeaux, Yashdeep Khopkar, 2014, Advanced Lithography.

Resist outgassing contamination growth results using both photon and electron exposures

Dominic Ashworth, Jaewoong Sohn, Alexander Friz, 2013, Advanced Lithography.

Mask qualification of a shifted gate contact issue by physical e-beam inspection and high landing energy SEM review : DI: Defect Inspection and Reduction

Hoang Nguyen, Yashdeep Khopkar, Abhinav Jain, 2019, 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).