Mihir Upadhyaya

发表

Dependence of contamination rates on key parameters in EUV optics

Eric M. Gullikson, Vibhu Jindal, Yu-Jen Fan, 2011, Advanced Lithography.

Developing particle detection test bench for vacuum components

Vibhu Jindal, Henry Herbol, Gregory Denbeaux, 2012, Advanced Lithography.

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015, Advanced Lithography.

Investigating printability of native defects on EUV mask blanks through simulations and experiments

Jenah Harris-Jones, Vibhu Jindal, Henry Herbol, 2014, Advanced Lithography.

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015 .

Resist outgassing contamination growth results using both photon and electron exposures

Dominic Ashworth, Jaewoong Sohn, Alexander Friz, 2013, Advanced Lithography.

A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks

Jenah Harris-Jones, Vibhu Jindal, Frank Goodwin, 2012, Advanced Lithography.

Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing

Yu-Jen Fan, Gregory Denbeaux, Cecilia Montgomery, 2013, Advanced Lithography.

Simulation study of cleaning induced extreme ultraviolet reflectivity loss mechanisms on mask blanks

Vibhu Jindal, Frank Goodwin, Gregory Denbeaux, 2012 .