U. Kroll

发表

Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition

A. Howling, U. Kroll, C. Hollenstein, 1992 .

Optical determination of the mass density of amorphous and microcrystalline silicon layers with different hydrogen contents

M. Vaněček, Z. Remeš, P. Torres, 1998 .

Influences of a high excitation frequency (70 MHz) in the glow discharge technique on the process plasma and the properties of hydrogenated amorphous silicon

Arvind Shah, A. Howling, U. Kroll, 1992 .

Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization

L. Feitknecht, J. Meier, C. Ballif, 2007 .

Reduction of the boron cross-contamination for plasma deposition of p?i?n devices in a single-chamber large area radio-frequency reactor

Arvind Shah, A. Howling, S. Benagli, 2004 .

From R&D to Mass Production of Micromorph Thin Film Silicon PV

D. Borello, T. Eisenhammer, Johannes Meier, 2012 .

Towards high-efficiency thin-film silicon solar cells with the “micromorph” concept

Valery Shklover, Ch. Hof, Diego Fischer, 1997 .

Powder Dynamics in Very High-Frequency Silane Plasmas

A. Howling, U. Kroll, C. Hollenstein, 1992 .