Mats Ekberg

发表

Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools

Hans Fosshaug, Mats Ekberg, Gunnar Kylberg, 2005, SPIE Advanced Lithography.

A device and a method for protecting an object against fault related over-currents, and its use

Li Ming, Hans Bernhoff, Jan Isberg, 1997 .

Laser pattern generator challenges in airborne molecular contamination protection

Oleg P. Kishkovich, Mats Ekberg, Swaraj Paul, 2003, Photomask Japan.

Recent results in HV measurement techniques

Mats Leijon, Thomas Eriksson, Tord Bengtsson, 1995 .

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Mikael Karlsson, Peter Björnängen, Mats Ekberg, 2004, SPIE Advanced Lithography.

PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement tool for 2:nd layer alignment metrology

Thomas Ostrom, Mats Ekberg, Hans A. Fosshaug, 2004, SPIE Advanced Lithography.

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Thomas Ostrom, Mats Ekberg, David Ruede, 2004, SPIE Advanced Lithography.

Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator

Per Askebjer, Robert Eklund, Johan Karlsson, 2004, SPIE Advanced Lithography.

Multilevel grating array illuminators manufactured by electron-beam lithography

Mohammad R. Taghizadeh, Jan Westerholm, Jari Turunen, 1992 .