Frida Liang

Integrated ADI optical metrology solution for lithography process control of CD and OV

Marlene Strobl, Wilhelm Tsai, Andy Lan, 2014, Advanced Lithography.

Chamber distortion control in a high volume manufacturing foundry environment

Frida Liang, David M. Owen, Jeffrey Mileham, 2017, 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO).

Wafer-shape metrics based foundry lithography

Frida Liang, Eric Bouche, Sean Lee, 2017, Advanced Lithography.

Chamber distortion control in a high volume manufacturing foundry environment

Frida Liang, David M. Owen, Jeffrey Mileham, 2017, ASMC 2017.