Vincent Couraudon

Integrated ADI optical metrology solution for lithography process control of CD and OV

Marlene Strobl, Wilhelm Tsai, Andy Lan, 2014, Advanced Lithography.

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Vincent Couraudon, Arie den Boef, Kaustuve Bhattacharyya, 2017, Advanced Lithography.

Advanced overlay control in volume manufacturing

Nelson Felix, Vincent Couraudon, Timon Fliervoet, 2011, 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Vincent Couraudon, Arie den Boef, Youping Zhang, 2015, Advanced Lithography.