Mingqi Li

Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry

Peter Trefonas, Michael J. Eller, Xisen Hou, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Contact hole shrink of 193nm NTD immersion resist

Vipul Jain, Jin Wuk Sung, Janet Wu, 2019, Advanced Lithography.

Development of spin-on metal hardmask (SOMHM) for advanced node

Peter Trefonas, Deyan Wang, Cong Liu, 2015, Advanced Lithography.

Research on the image data system used in printing quality inspection

Mingqi Li, 2011, 2011 IEEE 3rd International Conference on Communication Software and Networks.

Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry

Emile A. Schweikert, Peter Trefonas, Michael J. Eller, 2019 .