G. Smith

Yield considerations in the choice of 3D technology

G. Smith, L. Smith, S. Hosali, 2007, 2007 International Symposium on Semiconductor Manufacturing.

Selective phase modulation of NiSi using N-ion implantation for high performance dopant-segregated source/drain n-channel MOSFETs

Injo Ok, R. Jammy, P. Majhi, 2006, 2009 Symposium on VLSI Technology.

European Programmes on Emissions, Fuels and Engine Technologies (EPEFE) - Vehicle/Engine Technology

G. Smith, M. Signer, R. Steinbrink, 1996 .

CMOS band-edge schottky barrier heights using dielectric-dipole mitigated (DDM) metal/Si for source/drain contact resistance reduction

R. Jammy, Jiyoung Kim, P. Majhi, 2006, 2009 Symposium on VLSI Technology.