M. Shearer

Coupled Broad Ion Beam-Scanning Electron Microscopy (BIB-SEM) for polishing and three dimensional (3D) serial section tomography (SST).

P. Withers, A. Gholinia, E. Bousser, 2020, Ultramicroscopy.

Development of focused ion beam systems

H. Sawaragi, B. Thompson, R. Aihara, 1989 .

A 0–30 keV low‐energy focused ion beam system

S. Namba, K. Gamo, H. Kasahara, 1988 .

A focused ion beam system with a retarding mode objective lens

H. Sawaragi, H. Kasahara, R. Mimura, 1991 .

Optical system for a low‐energy focused ion beam

H. Kasahara, H. Sawaragi, W. Thompson, 1989 .

A High Throughput Electron Lithography System Using A Field Emission Gun

M. Isobe, Hitoshi Takemura, W. B. Thompson, 1989, Advanced Lithography.

Development of a Nanometric E-Beam Lithography System (JBX-5DII)

M. Isobe, Hitoshi Takemura, M. Hassel Shearer, 1985, Advanced Lithography.