Hoang V. Tran

High chi polymer development for DSA applications using RAFT technology

Michael T. Sheehan, William B. Farnham, Hoang V. Tran, 2013, Advanced Lithography.

Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology

Hiroshi Okazaki, Michael T. Sheehan, William B. Farnham, 2011, Advanced Lithography.