F. Thrum

发表

Gate edge roughness in electron beam direct write and its influence to device characteristics

C. Hohle, Katja Keil, Johannes Kretz, 2008, SPIE Advanced Lithography.

MAGIC: a European program to push the insertion of maskless lithography

S. Manakli, L. Pain, W. Pilz, 2008, SPIE Advanced Lithography.

Data preparation for EBDW

Katja Keil, Johannes Kretz, Kang-Hoon Choi, 2007, European Mask and Lithography Conference.

Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write

M. Tesauro, C. Hohle, Philipp Jaschinsky, 2009, European Mask and Lithography Conference.

PML2: the maskless multibeam solution for the 22nm node and beyond

C. Hohle, E. Platzgummer, H. Loeschner, 2009, Advanced Lithography.

Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines

C. Hohle, Katja Keil, Johannes Kretz, 2008, European Mask and Lithography Conference.

Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications

C. Hohle, Katja Keil, Johannes Kretz, 2007 .

CD control of direct versus complementary exposure for shaped beam writers and its correlation to the local registration error

C. Hohle, Johannes Kretz, K.-H. Choi, 2007 .

Integration of EBDW of one entire metal layer as substitution for optical lithography in 220nm node microcontrollers

C. Hohle, Johannes Kretz, K.-H. Choi, 2008 .