Yutaka Hojo

Focus measurement using SEM image analysis of circuit pattern

Hitoshi Sugahara, Shinichi Shinoda, Yasutaka Toyoda, 2016, SPIE Advanced Lithography.

SEM-contour shape analysis method for advanced semiconductor devices

Hiroyuki Shindo, Daisuke Hibino, Hideo Sakai, 2013, Advanced Lithography.

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2009, Advanced Lithography.

Development of New Stream Format with GDSII Upper Compatibility and High-Compression Rate

Nobuyuki Yoshioka, Junji Hirumi, Morihisa Hoga, 2002, Photomask Technology.

SEM-contour shape analysis based on circuit structure for advanced systematic defect inspection

Hiroyuki Shindo, Daisuke Fuchimoto, Yasutaka Toyoda, 2014, Advanced Lithography.

Shot number analysis at 65-nm node mask writing using VSB writer

Nobuyuki Yoshioka, Junji Hirumi, Morihisa Hoga, 2003, Photomask Japan.

Unified mask data formats for EB writers

Nobuyuki Yoshioka, Toshio Suzuki, Junji Hirumi, 2003, Photomask Japan.

Evolution and Future of Critical Dimension Measurement System for Semiconductor Processes

Atsuko Yamaguchi, Maki Tanaka, Toru Ikegami, 2011 .