L. Berenbaum

RESISTANCE MONITORING AND EFFECTS OF NONADHESION DURING ELECTROMIGRATION IN ALUMINUM FILMS

Robert Rosenberg, R. Rosenberg, L. Berenbaum, 1968 .

Electromigration Damage of Grain‐Boundary Triple Points in Al Thin Films

L. Berenbaum, 1971 .

Electromigration-induced failures in thin-film Al-Cu conductors

B. Agarwala, P. Peressini, L. Berenbaum, 1974 .

STUDY OF FAILURE MECHANISMS IN Al–Cu THIN FILMS BY HIGH‐VOLTAGE ELECTRON MICROSCOPY

B. Patnaik, L. Berenbaum, 1971 .

Effect of Oxygen on the Electromigration Behavior of Al Thin Films

L. Berenbaum, L. Berenbaum, 1972 .