Robert L. Bruce

发表

A silicon metamaterial chip-to-chip coupler for photonic flip-chip applications

Tymon Barwicz, Swetha Kamlapurkar, Yves Martin, 2017, 2017 Optical Fiber Communications Conference and Exhibition (OFC).

Pattern collapse mitigation strategies for EUV lithography

Robert L. Bruce, Michael A. Guillorn, Dario L. Goldfarb, 2012, Advanced Lithography.

Improving high aspect ratio processes for logic applications through gas chemistry and plasma discharge optimization

Robert L. Bruce, Sebastian Engelmann, Takefumi Suzuki, 2015 .

Hydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas

Robert L. Bruce, Mahmoud Khojasteh, Marinus Hopstaken, 2020, Advanced Lithography.

Optical demonstration of a compliant polymer interface between standard fibers and nanophotonic waveguides

Simon Laflamme, Tymon Barwicz, Swetha Kamlapurkar, 2015, 2015 Optical Fiber Communications Conference and Exhibition (OFC).

Evaluation of ALE processes for patterning

Robert L. Bruce, Sebastian Engelmann, Eric A. Joseph, 2016, SPIE Advanced Lithography.

Advanced plasma etch for the 10nm node and beyond

Robert L. Bruce, Sebastian Engelmann, M. Nakamura, 2013, Advanced Lithography.

A metamaterial converter centered at 1490nm for interfacing standard fibers to nanophotonic waveguides

Paul Fortier, Tymon Barwicz, Swetha Kamlapurkar, 2016, 2016 Optical Fiber Communications Conference and Exhibition (OFC).

Directed self-assembly patterning strategies for phase change memory applications

Nelson Felix, Chi-Chun Liu, Robert L. Bruce, 2017, Advanced Lithography.

An Investigation of Acoustic Cavitation Produced by Pulsed Ultrasound

Robert L. Bruce, Robert D. Middleton, 1987 .

Accurate Weight Mapping in a Multi-Memristive Synaptic Unit

Robert L. Bruce, S. R. Nandakumar, Irem Boybat, 2021, 2021 IEEE International Symposium on Circuits and Systems (ISCAS).

A Multi-Memristive Unit-Cell Array With Diagonal Interconnects for In-Memory Computing

Robert L. Bruce, Manuel Le Gallo, Benedikt Kersting, 2021, IEEE Transactions on Circuits and Systems II: Express Briefs.

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2008 .

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Plasma-surface interactions of advanced photoresists with C4F8∕Ar discharges: Plasma parameter dependencies

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists

Robert L. Bruce, Carlton G Willson, Gottlieb S. Oehrlein, 2011 .

Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma

Robert L. Bruce, Carlton G Willson, Gottlieb S. Oehrlein, 2010 .

Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer

Robert L. Bruce, Sebastian Engelmann, Hirokazu Matsumoto, 2017 .

Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

David B. Graves, Robert L. Bruce, C. G. Willson, 2010 .

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2010 .

Flip chip assembly with sub-micron 3D re-alignment via solder surface tension

Tymon Barwicz, Swetha Kamlapurkar, Yves Martin, 2015, 2015 IEEE 65th Electronic Components and Technology Conference (ECTC).

Highly selective silicon nitride etching to Si and SiO2 for a gate sidewall spacer using a CF3I/O2/H2 neutral beam

Robert L. Bruce, Ryan M. Martin, Seiji Samukawa, 2013 .

Fabrication of Sub-20 NM Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales

Ajay K. Royyuru, Markus Brink, Robert L. Bruce, 2015 .

Gel-on-a-chip: continuous, velocity-dependent DNA separation using nanoscale lateral displacement.

Robert L. Bruce, Gustavo Stolovitzky, Elizabeth A. Duch, 2019, Lab on a chip.

Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer

Robert L. Bruce, Sebastian Engelmann, Sandra C. Hernández, 2015 .

Demonstration of self-aligned flip-chip photonic assembly with 1.1dB loss and > 120nm bandwidth

Tymon Barwicz, Swetha Kamlapurkar, Yves Martin, 2016 .

Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2007 .

Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

David B. Graves, Robert L. Bruce, Gottlieb S. Oehrlein, 2010 .

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Robert L. Bruce, Sebastian Engelmann, Eric A. Joseph, 2016 .