Lisa-Michelle Milner

Latent image exposure monitor using scatterometry

S. Sohail H. Naqvi, John R. McNeil, Kirt C. Hickman, 1992, Advanced Lithography.

Use of scatterometry for resist process control

S. Sohail H. Naqvi, John R. McNeil, Kenneth P. Bishop, 1992, Advanced Lithography.

Grating line shape characterization using scatterometry

S. Sohail H. Naqvi, John R. McNeil, Susan M. Gaspar, 1991, Optics & Photonics.

SCATTEROMETRY APPLIED TO MICROELECTRONICS PROCESSING. PART II

John R. McNeil, Lisa-Michelle Milner, S. Sohail H. Naqvi, 1993 .

Lithography process monitor using light diffracted from a latent image

S. Sohail H. Naqvi, John R. McNeil, Kenneth P. Bishop, 1993, Advanced Lithography.